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"Performance improvement of self-aligned HfO2/TaN and SiON/TaN ..."

Tom Schram et al. (2005)

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DOI: 10.1016/J.MICROREL.2004.11.050

access: closed

type: Journal Article

metadata version: 2020-02-22

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Tom Schram, L.-Å. Ragnarsson, G. S. Lujan, W. Deweerd, J. Chen, W. Tsai, K. Henson, R. J. P. Lander, J. C. Hooker, J. Vertommen:
Performance improvement of self-aligned HfO₂/TaN and SiON/TaN nMOS transistors. Microelectron. Reliab. 45(5-6): 779-782 (2005)

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