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"Influence and model of gate oxide breakdown on CMOS inverters."

Rosana Rodríguez et al. (2003)

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DOI: 10.1016/S0026-2714(03)00247-6

access: closed

type: Journal Article

metadata version: 2020-02-22

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  - https://dblp.org/rec/journals/mr/RodriguezSLJC03
Rosana Rodríguez, James H. Stathis, Barry P. Linder, Rajiv V. Joshi, Ching-Te Chuang:
Influence and model of gate oxide breakdown on CMOS inverters. Microelectron. Reliab. 43(9-11): 1439-1444 (2003)

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