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"Silicon dioxide deposited by ECR-PECVD for low-temperature Si devices ..."

A. Pecora et al. (2005)

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DOI: 10.1016/J.MICROREL.2004.09.012

access: closed

type: Journal Article

metadata version: 2023-09-30

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A. Pecora, Luca Maiolo, A. Bonfiglietti, M. Cuscunà, F. Mecarini, Luigi Mariucci, Guglielmo Fortunato, N. D. Young:
Silicon dioxide deposited by ECR-PECVD for low-temperature Si devices processing. Microelectron. Reliab. 45(5-6): 879-882 (2005)

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