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"Enhanced reliability for low-temperature gate dielectric of MOS devices by ..."
David C. T. Or et al. (2003)
- David C. T. Or, Pui-To Lai, Johnny K. O. Sin, Paul C. K. Kwok, Jing-Ping Xu:
Enhanced reliability for low-temperature gate dielectric of MOS devices by N2O or NO plasma nitridation. Microelectron. Reliab. 43(1): 163-166 (2003)
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