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"Deep-amorphization and solid-phase epitaxial regrowth processes for hybrid ..."

Akiko Ohata et al. (2012)

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DOI: 10.1016/J.MICROREL.2012.05.014

access: closed

type: Journal Article

metadata version: 2021-09-17

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  - https://dblp.org/rec/journals/mr/OhataBCSWGFC12
Akiko Ohata, Young-Ho Bae, Sorin Cristoloveanu, Thomas Signamarcheix, J. Widiez, Bruno Ghyselen, Olivier Faynot, Laurent Clavelier:
Deep-amorphization and solid-phase epitaxial regrowth processes for hybrid orientation technologies in SOI MOSFETs with thin body. Microelectron. Reliab. 52(11): 2602-2608 (2012)

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