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"Percolative approach for failure time prediction of thin film ..."

E. Misra et al. (2005)

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DOI: 10.1016/J.MICROREL.2004.09.009

access: closed

type: Journal Article

metadata version: 2020-02-22

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E. Misra, Md. M. Islam, Mahbub Hasan, H. C. Kim, T. L. Alford:
Percolative approach for failure time prediction of thin film interconnects under high current stress. Microelectron. Reliab. 45(2): 391-395 (2005)

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