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"Comparison of metal gate electrodes on MOCVD HfO₂."

Max C. Lemme et al. (2005)

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DOI: 10.1016/J.MICROREL.2004.11.018

access: closed

type: Journal Article

metadata version: 2022-06-30

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Max C. Lemme, J. K. Efavi, H. D. B. Gottlob, Thomas Mollenhauer, Thorsten Wahlbrink, Heinrich Kurz:
Comparison of metal gate electrodes on MOCVD HfO₂. Microelectron. Reliab. 45(5-6): 953-956 (2005)

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