"Evidence of chlorine ion penetration in InP/InAsP quantum well structures ..."

Jean-Pierre Landesman et al. (2015)

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DOI: 10.1016/J.MICROREL.2015.07.029

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type: Journal Article

metadata version: 2022-10-02

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Jean-Pierre Landesman, Christophe Levallois, Juan Jiménez, Frédéric Pommereau, Yoan Léger, Alexandre Beck, Thomas Delhaye, Alfredo Torres, Cesare Frigeri, Ahmed Rhallabi:
Evidence of chlorine ion penetration in InP/InAsP quantum well structures during dry etching processes and effects of induced-defects on the electronic and structural behaviour. Microelectron. Reliab. 55(9-10): 1750-1753 (2015)

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