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"Silicon nitride etch characteristics in SF6/O2 and ..."
I. J. Kim et al. (2012)
- I. J. Kim, H. K. Moon, J. H. Lee, Nae-Eung Lee
, J. W. Jung, S. H. Cho:
Silicon nitride etch characteristics in SF6/O2 and C3F6O/O2 plasmas and evaluation of their global warming effects. Microelectron. Reliab. 52(12): 2970-2974 (2012)
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