"Voltage dependent degradation of HfSiON/SiO2 nMOSFETs under ..."

Cheolgyu Kim, Hyeokjin Kim, Bongkoo Kang (2014)

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DOI: 10.1016/J.MICROREL.2014.06.001

access: closed

type: Journal Article

metadata version: 2020-02-22

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Cheolgyu Kim, Hyeokjin Kim, Bongkoo Kang:
Voltage dependent degradation of HfSiON/SiO₂ nMOSFETs under positive bias temperature instability. Microelectron. Reliab. 54(11): 2383-2387 (2014)

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