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"Ferroelectric of HfO2 dielectric layer sputtered with TiN or ..."
P. C. Juan et al. (2018)
- P. C. Juan, K. C. Lin, H. Y. Chu, Y. C. Kuo, H. W. Wang, T. Y. Shih:
Ferroelectric of HfO2 dielectric layer sputtered with TiN or ZrN for sandwich-like metal-insulator-metal capacitors. Microelectron. Reliab. 83: 242-248 (2018)
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