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"Performance of nonvolatile memory by using band-engineered ..."

X. D. Huang, Pui-To Lai, Johnny K. O. Sin (2012)

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DOI: 10.1016/J.MICROREL.2012.04.006

access: closed

type: Journal Article

metadata version: 2023-10-02

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X. D. Huang, Pui-To Lai, Johnny K. O. Sin:
Performance of nonvolatile memory by using band-engineered SrTiO₃/HfON stack as charge-trapping layer. Microelectron. Reliab. 52(11): 2527-2531 (2012)

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