"The influence of liners with Ti, Ta or Ru finish on thin Cu films."

David Gross et al. (2014)

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DOI: 10.1016/J.MICROREL.2014.07.121

access: closed

type: Journal Article

metadata version: 2020-02-22

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David Gross, Sabine Haag, Martin Schneider-Ramelow, Klaus-Dieter Lang:
The influence of liners with Ti, Ta or Ru finish on thin Cu films. Microelectron. Reliab. 54(9-10): 1877-1882 (2014)

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