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"Characterization of thin and ultra-thin SiO2 films and ..."

Werner Frammelsberger et al. (2003)

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DOI: 10.1016/S0026-2714(03)00260-9

access: closed

type: Journal Article

metadata version: 2022-12-07

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Werner Frammelsberger, Guenther Benstetter, Thomas Schweinböck, Richard J. Stamp, Janice Kiely:
Characterization of thin and ultra-thin SiO₂ films and SiO₂/Si interfaces with combined conducting and topographic atomic force microscopy. Microelectron. Reliab. 43(9-11): 1465-1470 (2003)

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