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"Reversible dielectric breakdown in ultrathin Hf based high-k stacks under ..."

Albert Crespo-Yepes et al. (2009)

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DOI: 10.1016/J.MICROREL.2009.06.029

access: closed

type: Journal Article

metadata version: 2021-04-09

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Albert Crespo-Yepes, Javier Martín-Martínez, Rosana Rodríguez, Montserrat Nafría, Xavier Aymerich:
Reversible dielectric breakdown in ultrathin Hf based high-k stacks under current-limited stresses. Microelectron. Reliab. 49(9-11): 1024-1028 (2009)

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