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"Implementation of high-k and metal gate materials for the 45nm node and ..."

S. Beckx et al. (2005)

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DOI: 10.1016/J.MICROREL.2004.11.005

access: closed

type: Journal Article

metadata version: 2023-09-30

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S. Beckx, M. Demand, S. Locorotondo, K. Henson, M. Claes, V. Paraschiv, D. Shamiryan, P. Jaenen, W. Boullart, S. Degendt:
Implementation of high-k and metal gate materials for the 45nm node and beyond: gate patterning development. Microelectron. Reliab. 45(5-6): 1007-1011 (2005)

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