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"Design optimization of gate-silicided ESD NMOSFETs in a 45 nm bulk CMOS ..."

David Alvarez et al. (2009)

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DOI: 10.1016/J.MICROREL.2009.06.051

access: closed

type: Journal Article

metadata version: 2023-02-02

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David Alvarez, Kiran V. Chatty, Christian Russ, Michel J. Abou-Khalil, Junjun Li, Robert Gauthier, Kai Esmark, Ralph Halbach, Christopher Seguin:
Design optimization of gate-silicided ESD NMOSFETs in a 45 nm bulk CMOS technology. Microelectron. Reliab. 49(12): 1417-1423 (2009)

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