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"Mass patterning of polysiloxane layers using spin coating and ..."

Benoît Torbiéro et al. (2006)

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DOI: 10.1016/J.MEJO.2005.04.054

access: closed

type: Journal Article

metadata version: 2023-01-20

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Benoît Torbiéro, Marie-Laure Pourciel-Gouzy, Iryna Humenyuk, Jean-Baptiste Doucet, Augustin Martinez, Pierre Temple-Boyer:
Mass patterning of polysiloxane layers using spin coating and photolithography techniques. Microelectron. J. 37(2): 133-136 (2006)

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