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"Advanced etching of silicon based on deep reactive ion etching for silicon ..."
Frédéric Marty et al. (2005)
- Frédéric Marty, Lionel Rousseau, Bassam Saadany, B. Mercier, Olivier Français
, Y. Mita, Tarik Bourouina
:
Advanced etching of silicon based on deep reactive ion etching for silicon high aspect ratio microstructures and three-dimensional micro- and nanostructures. Microelectron. J. 36(7): 673-677 (2005)
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