"Investigation on negative capacitance FinEFT beyond 7 nm node from device ..."

Jiali Huo et al. (2021)

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DOI: 10.1016/J.MEJO.2021.105196

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type: Journal Article

metadata version: 2022-10-02

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Jiali Huo, Weixing Huang, Fan Zhang, Shengli Zhang, Weizhuo Gan, Qiang Huo, Yuwei Cai, Qingzhu Zhang, Yongliang Li, Huilong Zhu, Huaxiang Yin, Zhenhua Wu:
Investigation on negative capacitance FinEFT beyond 7 nm node from device to circuit. Microelectron. J. 116: 105196 (2021)

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