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"Preparation and characteristics of the wide gap semiconductor ..."

Yong-ning He et al. (2005)

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DOI: 10.1016/J.MEJO.2004.11.005

access: closed

type: Journal Article

metadata version: 2020-02-22

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  - https://dblp.org/rec/journals/mj/HeZYXLZH05
Yong-ning He, Jing-wen Zhang, Xiaodong Yang, Qing-an Xu, Xinghui Liu, Chang-Chun Zhu, Xun Hou:
Preparation and characteristics of the wide gap semiconductor Mg_0.18Zn_0.82O thin film by L-MBE. Microelectron. J. 36(2): 125-128 (2005)

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