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"Scratch-concerned yield modeling for IC manufacturing involved with a ..."

Jiao-jiao Zhu et al. (2012)

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DOI: 10.1631/JZUS.C1100242

access: closed

type: Journal Article

metadata version: 2020-05-13

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  - https://dblp.org/rec/journals/jzusc/ZhuLCYY12
Jiao-jiao Zhu, Xiao-hua Luo, Li-sheng Chen, Yi Ye, Xiaolang Yan:
Scratch-concerned yield modeling for IC manufacturing involved with a chemical mechanical polishing process. J. Zhejiang Univ. Sci. C 13(5): 376-384 (2012)

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