"Two-step gate-recess process combining selective wet-etching and digital ..."

Yinghui Zhong et al. (2017)

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DOI: 10.1631/FITEE.1601121

access: closed

type: Journal Article

metadata version: 2024-10-06

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Yinghui Zhong, Shu-xiang Sun, Wen-bin Wong, Haili Wang, Xiao-Ming Liu, Zhiyong Duan, Peng Ding, Zhi Jin:
Two-step gate-recess process combining selective wet-etching and digital wet-etching for InAlAs/InGaAs InP-based HEMTs. Frontiers Inf. Technol. Electron. Eng. 18(8): 1180-1185 (2017)

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