"Characterizing the impact of process variation on 45 nm NoC-based CMPs."

Carles Hernández et al. (2011)

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DOI: 10.1016/J.JPDC.2010.09.006

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type: Journal Article

metadata version: 2023-11-12

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Carles Hernández, Antoni Roca, José Flich, Federico Silla, José Duato:
Characterizing the impact of process variation on 45 nm NoC-based CMPs. J. Parallel Distributed Comput. 71(5): 651-663 (2011)

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