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"Lithography Simulation Basics and a Study on Impact of Lithographic ..."

Aswin Sreedhar, Sandip Kundu (2008)

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DOI: 10.1166/JOLPE.2008.192

access: closed

type: Journal Article

metadata version: 2020-05-22

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  - https://dblp.org/rec/journals/jolpe/SreedharK08
Aswin Sreedhar, Sandip Kundu:
Lithography Simulation Basics and a Study on Impact of Lithographic Process Window on Gate and Path Delays. J. Low Power Electron. 4(3): 392-401 (2008)

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