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"Technostress and Organization Loyalty of IS&T Workers - A Path Model."

Brenda L. Mak et al. (2010)

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DOI: —

access: closed

type: Journal Article

metadata version: 2020-04-01

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  - journals/ijipm/MakSBW10
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  - https://dblp.org/rec/journals/ijipm/MakSBW10
Brenda L. Mak, Hy Sockel, Judie A. Bucholz, Miriam W. Webb:
Technostress and Organization Loyalty of IS&T Workers - A Path Model. Int. J. Inf. Process. Manag. 1(2): 4-17 (2010)

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