"Simulation of material and processing effects on photoresist line-edge ..."

G. P. Patsis et al. (2006)

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DOI: 10.1504/IJCSE.2006.012765

access: closed

type: Journal Article

metadata version: 2020-07-30

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G. P. Patsis, M. D. Nijkerk, L. H. A. Leunissen, E. Gogolides:
Simulation of material and processing effects on photoresist line-edge roughness. Int. J. Comput. Sci. Eng. 2(3/4): 134-143 (2006)

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