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"Organosilicon-Based Thin Film Formation in Very High-Frequency Plasma ..."

Afif Hamzens et al. (2023)

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DOI: 10.20965/IJAT.2023.P0575

access: closed

type: Journal Article

metadata version: 2023-11-28

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  - https://dblp.org/rec/journals/ijat/HamzensKMUOK23
Afif Hamzens, Kento Kitamura, Shota Mochizuki, Leapheng Uon, Hiromasa Ohmi, Hiroaki Kakiuchi:
Organosilicon-Based Thin Film Formation in Very High-Frequency Plasma Under Atmospheric Pressure. Int. J. Autom. Technol. 17(6): 575-582 (2023)

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