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"Stochastic Modeling and Local CD Uniformity Comparison between Negative ..."

Itaru Kamohara et al. (2022)

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DOI: 10.1587/TRANSELE.2021ECP5010

access: closed

type: Journal Article

metadata version: 2022-05-12

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Itaru Kamohara, Ulrich Welling, Ulrich Klostermann, Wolfgang Demmerle:
Stochastic Modeling and Local CD Uniformity Comparison between Negative Metal-Based, Negative- and Positive-Tone Development EUV Resists. IEICE Trans. Electron. 105-C(1): 35-46 (2022)

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