"Dry Etching Technologies of Optical Device and III-V Compound Semiconductors."

Ryuichiro Kamimura, Kanji Furuta (2017)

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DOI: 10.1587/TRANSELE.E100.C.150

access: closed

type: Journal Article

metadata version: 2020-04-11

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  - https://dblp.org/rec/journals/ieicet/KamimuraF17
Ryuichiro Kamimura, Kanji Furuta:
Dry Etching Technologies of Optical Device and III-V Compound Semiconductors. IEICE Trans. Electron. 100-C(2): 150-155 (2017)

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