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"Low-Temperature Activation in Boron Ion-Implanted Silicon by Soft X-Ray ..."

Akira Heya, Naoto Matsuo, Kazuhiro Kanda (2016)

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DOI: 10.1587/TRANSELE.E99.C.474

access: closed

type: Journal Article

metadata version: 2020-04-11

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  persistent URL:
  - https://dblp.org/rec/journals/ieicet/HeyaMK16
Akira Heya, Naoto Matsuo, Kazuhiro Kanda:
Low-Temperature Activation in Boron Ion-Implanted Silicon by Soft X-Ray Irradiation. IEICE Trans. Electron. 99-C(4): 474-480 (2016)

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