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ORCID"Selective etching of HfN gate electrode for HfN/HfSiON gate stack in-situ ..."
Takahiro Sano, Shun'ichiro Ohmi (2011)
- Takahiro Sano, Shun'ichiro Ohmi:
Selective etching of HfN gate electrode for HfN/HfSiON gate stack in-situ formations. IEICE Electron. Express 8(18): 1492-1497 (2011)
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