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"Lithography at a wavelength of 193 nm."

Mordechai Rothschild et al. (1997)

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DOI: 10.1147/RD.411.0049

access: closed

type: Journal Article

metadata version: 2020-03-13

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  - https://dblp.org/rec/journals/ibmrd/RothschildFKPS97
Mordechai Rothschild, Anthony R. Forte, Roderick R. Kunz, Susan C. Palmateer, Janusz H. C. Sedlacek:
Lithography at a wavelength of 193 nm. IBM J. Res. Dev. 41(1&2): 49-56 (1997)

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