"Pattern Partitioning for Enhanced Proximity-Effect Corrections in ..."

Mihir Parikh, Donald E. Schreiber (1980)

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DOI: 10.1147/RD.245.0530

access: closed

type: Journal Article

metadata version: 2020-05-12

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Mihir Parikh, Donald E. Schreiber:
Pattern Partitioning for Enhanced Proximity-Effect Corrections in Electron-Beam Lithography. IBM J. Res. Dev. 24(5): 530-536 (1980)

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