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"Low-temperature Si and Si: Ge epitaxy by ultrahigh vacuum/chemical vapor ..."

Bernard S. Meyerson (2000)

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DOI: 10.1147/RD.441.0132

access: closed

type: Journal Article

metadata version: 2020-03-13

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Bernard S. Meyerson:
Low-temperature Si and Si: Ge epitaxy by ultrahigh vacuum/chemical vapor deposition: Process fundamentals. IBM J. Res. Dev. 44(1): 132-141 (2000)

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