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"Ultrathin nitrided gate dielectrics: Plasma processing, chemical ..."

Gerald Lucovsky (1999)

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DOI: 10.1147/RD.433.0301

access: closed

type: Journal Article

metadata version: 2020-03-13

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Gerald Lucovsky:
Ultrathin nitrided gate dielectrics: Plasma processing, chemical characterization, performance, and reliability. IBM J. Res. Dev. 43(3): 301-326 (1999)

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