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"TCAD development for lithography resolution enhancement."

Lars Liebmann et al. (2001)

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DOI: 10.1147/RD.455.0651

access: closed

type: Journal Article

metadata version: 2020-03-13

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  - https://dblp.org/rec/journals/ibmrd/LiebmannMWLLD01
Lars Liebmann, Scott M. Mansfield, Alfred K. Wong, Mark A. Lavin, William C. Leipold, Timothy G. Dunham:
TCAD development for lithography resolution enhancement. IBM J. Res. Dev. 45(5): 651-666 (2001)

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