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"Reactive ion etching technology in thin-film-transistor processing."

Yue Kuo (1992)

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DOI: 10.1147/RD.361.0069

access: closed

type: Journal Article

metadata version: 2020-03-13

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  - journals/ibmrd/Kuo92
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Yue Kuo:
Reactive ion etching technology in thin-film-transistor processing. IBM J. Res. Dev. 36(1): 69-75 (1992)

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