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"(Ba, Sr)TiO3 dielectrics for future stacked- capacitor DRAM."

David E. Kotecki et al. (1999)

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DOI: 10.1147/RD.433.0367

access: closed

type: Journal Article

metadata version: 2023-09-30

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  - https://dblp.org/rec/journals/ibmrd/KoteckiBSLSLSACDGKPWW99
David E. Kotecki, John D. Baniecki, Hua Shen, Robert B. Laibowitz, Katherine L. Saenger, Jingyu Jenny Lian, Thomas M. Shaw, Satish D. Athavale, Cyril Cabral Jr., Peter R. Duncombe, Martin Gutsche, Gerhard Kunkel, Young-Jin Park, Yun-Yu Wang, Richard Wise:
(Ba, Sr)TiO3 dielectrics for future stacked- capacitor DRAM. IBM J. Res. Dev. 43(3): 367-382 (1999)

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