"Chemical and physical aspects of the post-exposure baking process used for ..."

William D. Hinsberg et al. (2001)

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DOI: 10.1147/RD.455.0667

access: closed

type: Journal Article

metadata version: 2020-03-13

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William D. Hinsberg, Frances A. Houle, Martha I. Sanchez, Gregory M. Wallraff:
Chemical and physical aspects of the post-exposure baking process used for positive-tone chemically amplified resists. IBM J. Res. Dev. 45(5): 667-682 (2001)

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