"Photoresists for 193-nm lithography."

Robert D. Allen et al. (1997)

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DOI: 10.1147/RD.411.0095

access: closed

type: Journal Article

metadata version: 2020-03-13

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Robert D. Allen, Gregory M. Wallraff, Donald C. Hofer, Roderick R. Kunz:
Photoresists for 193-nm lithography. IBM J. Res. Dev. 41(1&2): 95-104 (1997)

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