"A comprehensive study of device variability of sub-5 nm nanosheet ..."

Haowen Luo et al. (2023)

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DOI: 10.1007/S11432-021-3399-3

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type: Journal Article

metadata version: 2023-06-26

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Haowen Luo, Ruihan Li, Xiangshui Miao, Xingsheng Wang:
A comprehensive study of device variability of sub-5 nm nanosheet transistors and interplay with quantum confinement variation. Sci. China Inf. Sci. 66(2) (2023)

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