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"Study on Degradation of SF6 in the Presence of H2O ..."

Xiaoxing Zhang et al. (2018)

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DOI: 10.1109/ACCESS.2018.2879157

access: open

type: Journal Article

metadata version: 2023-09-18

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Xiaoxing Zhang, Zhaolun Cui, Yalong Li, Hanyan Xiao, Yi Li, Ju Tang:
Study on Degradation of SF₆ in the Presence of H₂O and O₂ Using Dielectric Barrier Discharge. IEEE Access 6: 72748-72756 (2018)

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