"Conformal and Ultra Shallow Junction Formation Achieved Using a ..."

Seunghun Baik et al. (2020)

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DOI: 10.1109/ACCESS.2020.3024636

access: open

type: Journal Article

metadata version: 2021-10-14

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Seunghun Baik, Dong-Jae Kwon, Hongki Kang, Jae Eun Jang, Jaewon Jang, Y. S. Kim, Hyuk-Jun Kwon:
Conformal and Ultra Shallow Junction Formation Achieved Using a Pulsed-Laser Annealing Process Integrated With a Modified Plasma Assisted Doping Method. IEEE Access 8: 172166-172174 (2020)

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