Stop the war!

Остановите войну!

for scientists:

default search action

combined dblp search
author search
venue search
publication search

ask others

"Formation of high resistivity phases of nickel silicide at small area."

Ryuji Tomita et al. (2013)

> Home

Details and statistics

DOI: 10.1016/J.MICROREL.2012.12.013

access: closed

type: Journal Article

metadata version: 2020-08-17

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - journals/mr/TomitaKYMUTKNMI13
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/mr/TomitaKYMUTKNMI13
Ryuji Tomita, Hidehiko Kimura, M. Yasuda, K. Maeda, S. Ueno, T. Tomizawa, Y. Kunimune, H. Nakamura, M. Moritoki, Hiroshi Iwai:
Formation of high resistivity phases of nickel silicide at small area. Microelectron. Reliab. 53(5): 659-664 (2013)

a service of

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.