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"Chemical vapor deposition of tantalum nitride films for metal gate ..."

Martin Lemberger, A. Baunemann, Anton J. Bauer (2007)

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DOI: 10.1016/J.MICROREL.2007.01.032

access: closed

type: Journal Article

metadata version: 2020-02-22

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Martin Lemberger, A. Baunemann, Anton J. Bauer:
Chemical vapor deposition of tantalum nitride films for metal gate application using TBTDET and novel single-source MOCVD precursors. Microelectron. Reliab. 47(4-5): 635-639 (2007)

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