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"Post-process die-level electromagnetic field analysis on microwave CMOS ..."

Farshad Eshghabadi et al. (2016)

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DOI: 10.1016/J.VLSI.2015.03.001

access: closed

type: Journal Article

metadata version: 2020-02-20

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Farshad Eshghabadi, Fatemeh Banitorfian, Norlaili Mohd Noh, Mohd Tafir Mustaffa, Asrulnizam Bin Abd Manaf:
Post-process die-level electromagnetic field analysis on microwave CMOS low-noise amplifier for first-pass silicon fabrication success. Integr. 52: 217-227 (2016)

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