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"Carbon Nanomaterials: The Ideal Interconnect Technology for ..."

Hong Li, Chuan Xu, Kaustav Banerjee (2010)

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DOI: 10.1109/MDT.2010.55

access: closed

type: Journal Article

metadata version: 2020-05-17

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  persistent URL:
  - https://dblp.org/rec/journals/dt/LiXB10
Hong Li, Chuan Xu, Kaustav Banerjee:
Carbon Nanomaterials: The Ideal Interconnect Technology for Next-Generation ICs. IEEE Des. Test Comput. 27(4): 20-31 (2010)

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