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"Smart Way to Adjust Schottky Barrier Height in 130 nm BiCMOS Process for ..."

Vincent Gidel et al. (2020)

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DOI: 10.1109/RWS45077.2020.9050042

access: closed

type: Conference or Workshop Paper

metadata version: 2020-04-15

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  - conf/rws/GidelG0AGBLD20
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  - https://dblp.org/rec/conf/rws/GidelG0AGBLD20
Vincent Gidel, Frédéric Gianesello, Pascal Chevalier, Grégory Avenier, Nicolas Guitard, Michel Buczko, Cyril Luxey, Guillaume Ducournau:
Smart Way to Adjust Schottky Barrier Height in 130 nm BiCMOS Process for sub-THz Applications. RWS 2020: 337-340

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