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"Electromigration Reliability Comparison of Cu and Al Interconnects."
Syed M. Alam et al. (2005)
- Syed M. Alam, Frank L. Wei, Chee Lip Gan, Carl V. Thompson, Donald E. Troxel:
Electromigration Reliability Comparison of Cu and Al Interconnects. ISQED 2005: 303-308
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